Monocrystalline silicon thin film for cost-cutting solar cells with 10-times faster growth rate fabricated
(Tokyo, March 16) A research team from Waseda University and Tokyo Institute of Technology (Tokyo Tech) have successfully produced high-quality thin film monocrystalline silicon with a reduced crystal defect density down to the silicon wafer level at a growth rate that is more than 10 times higher than before. In principle, this method can improve the raw material yield to nearly 100%. Therefore, it can be expected that this technology will make it possible to drastically reduce manufacturing costs while maintaining the power generation efficiency of monocrystalline silicon solar cells, which are used in most high efficient solar cells.
The results are published in the Royal Society of Chemistry (RSC) journal CrystEngComm and will be featured on the inside front cover of the issue.